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Hexamethyl Disilazane (HMDS) CAS No.999-97-3

Hexamethyl Disilazane (HMDS) CAS No.999-97-3

Mf: c6h19nsi2
MW: 161.39
Einecs: 213-668-5
Kev Muag Khoom Txhua Txhua Xyoo: 1,000 MTS
Chav Nqe: 3.35USd / kg (keeb kwm siv nqi ib tuj, raug rau qhov tseeb hais.)

Khoom Taw qhia

Hexamethlaslisilailazane Cov Ntaub Ntawv

Khoom npe:

Hexamethlslisilazane

Cov lus txhais lus:

((CH3) 3SI) 2NH; 1,1,1,3,3,3 - hexamethyl-disilazan;

1,1,1 {- trimethyl - n- (chimethylsilyl) -Silanamin;

Disilazane, 1,1,1,3,3,3 {{- hexamethyl-; bis (cheesethylsilyl) Amine;

Hmws; hexamethyl disilizane;

Hexamethlslasily

CAS:

999-97-3

Mf:

C6h19Nsi2

Mw:

161.39

Einecs:

213-668-5

Hexamethlslisilailazane Tshuaj Muaj Zog

Melting taw tes

-78 Degree

Kub taw tes

125℃(lit.)

ceev

0.774 g / ml ntawm 25℃(lit.)

vapor ceev 4.6 (vs huab cua)

vapor siab

20 HPA (20 degree)

Refronction Index

n20 / d 1.407 (lit.)

Fp

57.2 Qib F

Cia temp.

Khw hauv qab +30 degree.

so

Kev ua haujlwm tsis meej nrog acetone, benzene, ethyl ether, hephane thiab perchlorethylene.

pa kua muag

30 (ntawm 25 degree)

puab

Kua

xim

Tsis muaj kob

Lub ntiajteb txawj nqus tshwj xeeb

0.774

Tus ntxhiab Ammonia tsw
Ph ntau 8.5

Kev Txwv Tsis pub

0.8-25.9%(V)

Dej solubility

Sweacts

Hnov tau

Kev noo noo nkag

HYDRYTIC rhiab 7: Rov qab ua kom qeeb nrog noo noo / Dej

Merck

14,4689

Khi

635752

Hexamethlaslisilazane Kev Siv thiab Synthesis

Kev siv

Hexamethleelslasilazane yog siv rau methyl silane alkylation (cepicospation thiab ntau yam kev tiv thaiv hydroxylen rau tshuaj tua kab mob. Nws tseem yog ib qho ntawm cov neeg tseem ceeb tshaj plaws rau kev tsim cov lamivudine. Nws ua haujlwm ua tus neeg saib xyuas kev kho mob hauv diaomite, cov carbon dub, thiab titanium, nrog rau kev ntxiv rau cov photoresist hauv semiconductor kev lag luam. Nws yog siv los ua tus neeg saib xyuas kev kho mob rau lub kua muag tiv taus lub zog. Nws ua haujlwm raws li cov kuab tshuaj hauv cov khoom siv hauv siab thiab cov organometallic chemistry. Nws ua raws li tus advesion promoter rau photoresist hauv photolithography. Nws yog siv los npaj chimethylsilyl muaj kev pab los ntawm hydroxy tebchaw. Nws yog siv los ua lwm txoj rau kev xaiv qhov chaw ziab khaub ncaws kom qhuav thaum npaj cov qauv hauv hluav taws xob. Nws yog ntxiv rau qhov kev tshuaj xyuas kom tau cov khoom siv kuaj mob silylates thaum pyrolysis hauv cov roj chromatography {}} huab tais spectrometry.

Kev piav qhia dav dav

Hexamethlaslisilazane tshwm ua kua. Tej zaum yuav lom los ntawm kev noj khoom haus. Kev npau taws tsis zoo thiab qhov muag. Cov vapors hnyav dua cua. Tej zaum yuav emit muaj kuab lom nitrogen oxide fumes thaum rhuab mus decomposition. Siv los ua kom deactivate cov ntaub ntawv chromatography cov ntaub ntawv thiab los txhawb nqa cov khoom nplaum ntawm cov photoresists hauv kev lag luam hluav taws xob.

Huab cua & Dej Rwg

Muaj nplaim taws heev. Noo noo rhiab.

Cim npe nrov: hexamethyl disilazane (hmds) cas no.999-97-3, China, manufacturers, suppliers, factory, custom, wholesale

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